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Clean room FFU filter membrane for dust-free workshops



The filter is usually combined with the centrifugal fan to form a fan filter unit or fan filter unit, referred to as FFU. The clean room FFU filter membrane is the core component. …

The filter is usually combined with the centrifugal fan to form a fan filter unit or fan filter unit, referred to as FFU.

The clean room FFU filter membrane is the core component.

Clean rooms are also called dust-free workshops, dust-free rooms or clean rooms.

It refers to a well-sealed space where air cleanliness, temperature, humidity, pressure, noise and other parameters are controlled as needed.

The development of clean rooms is closely related to modern industry and cutting-edge technology. Since the precision machinery industry (such as gyroscopes, micro bearings, etc. processing), the semiconductor industry (such as large-scale integrated circuit production), etc. must achieve a very high dust-free level In order to meet the production requirements, this greatly promotes the development of clean room technology.

Clean rooms are currently widely used in industries such as precision machinery, semiconductors, aerospace, and atomic energy.

New Material Technology Co., Ltd. is a high-tech enterprise specializing in the research, development and production of clean room FFU filter membranes and series of products. We have advanced ptfe membrane production lines, coating and composite production lines, which are at the domestic advanced level.

Clean room FFU filter membrane is a microporous film produced using polytetrafluoroethylene dispersion resin through special processes such as premixing, extrusion, calendering, and biaxial stretching.

The surface morphology of the microporous film is a spider web-like microporous structure.

Pores are formed between the microfibers, and the arrangement direction of the microfibers is basically parallel to the stretching direction; the junction of the fiber bundles is the node, which is formed by the entanglement of many microfibers.

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Author: clsrich

 
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